Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering

Martínek, Tomáš; Kudělka, Josef; Navrátil, Milan; Křesálek, Vojtěch; Fejfar, Antonín; Hývl, Matěj; Sobota, Jaroslav

dc.title	Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering	en
dc.contributor.author	Martínek, Tomáš
dc.contributor.author	Kudělka, Josef
dc.contributor.author	Navrátil, Milan
dc.contributor.author	Křesálek, Vojtěch
dc.contributor.author	Fejfar, Antonín
dc.contributor.author	Hývl, Matěj
dc.contributor.author	Sobota, Jaroslav
dc.relation.ispartof	IEEE-NANO 2015 - 15th International Conference on Nanotechnology
dc.identifier.isbn	978-1-4673-8156-7
dc.date.issued	2015
dc.citation.spage	510
dc.citation.epage	513
dc.event.title	15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015
dc.event.location	Rome
utb.event.state-en	Italy
utb.event.state-cs	Itálie
dc.event.sdate	2015-07-27
dc.event.edate	2015-07-30
dc.type	conferenceObject
dc.language.iso	en
dc.publisher	Institute of Electrical and Electronics Engineers (IEEE)
dc.identifier.doi	10.1109/NANO.2015.7388651
dc.relation.uri	http://ieeexplore.ieee.org/document/7388651/
dc.subject	atomic force microscopy	en
dc.subject	nanocharacterization	en
dc.subject	nanometrology	en
dc.subject	tungsten	en
dc.subject	ultra-thin film	en
dc.description.abstract	In this article, atomic force microscopy was used for nanoscale characterization of ultra-thin tungsten films which were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the surface. © 2015 IEEE.	en
utb.faculty	Faculty of Applied Informatics
dc.identifier.uri	http://hdl.handle.net/10563/1006415
utb.identifier.obdid	43873851
utb.identifier.scopus	2-s2.0-84964329824
utb.identifier.wok	000380515200031
utb.source	d-scopus
dc.date.accessioned	2016-07-26T14:58:28Z
dc.date.available	2016-07-26T14:58:28Z
utb.contributor.internalauthor	Martínek, Tomáš
utb.contributor.internalauthor	Kudělka, Josef
utb.contributor.internalauthor	Navrátil, Milan
utb.contributor.internalauthor	Křesálek, Vojtěch
utb.fulltext.affiliation	Tomáš Martínek, Josef Kudělka, Milan Navrátil, Vojtěch Křesálek, Antonín Fejfar, Matěj Hývl, Jaroslav Sobota Tomas Bata University in Zlín Faculty of Applied Informatics Czech Republic Institute of Physics ASCR Czech Republic Institute of Scientific Instruments ASCR Czech Republic
utb.fulltext.dates	-
utb.fulltext.faculty	Faculty of Applied Informatics
utb.fulltext.faculty	Faculty of Applied Informatics
utb.fulltext.faculty	Faculty of Applied Informatics
utb.fulltext.faculty	Faculty of Applied Informatics