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The effect of scratching direction in AFM nanolithography

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dc.title The effect of scratching direction in AFM nanolithography en
dc.contributor.author Kudělka, Josef
dc.contributor.author Martínek, Tomáš
dc.contributor.author Navrátil, Milan
dc.contributor.author Křesálek, Vojtěch
dc.relation.ispartof 7th International Conference on Information Science and Technology, ICIST 2017 - Proceedings
dc.identifier.issn 2164-4357 Scopus Sources, Sherpa/RoMEO, JCR
dc.identifier.isbn 978-1-5090-5401-5
dc.date.issued 2017
dc.citation.spage 331
dc.citation.epage 334
dc.event.title 7th International Conference on Information Science and Technology, ICIST 2017
dc.event.location Da Nang
utb.event.state-en Vietnam
utb.event.state-cs Vietnam
dc.event.sdate 2017-04-16
dc.event.edate 2017-04-19
dc.type conferenceObject
dc.language.iso en
dc.publisher Institute of Electrical and Electronics Engineers (IEEE)
dc.identifier.doi 10.1109/ICIST.2017.7926779
dc.relation.uri http://ieeexplore.ieee.org/abstract/document/7926779/
dc.subject scractching direction en
dc.subject AFM scratching en
dc.subject scanning probe lithography en
dc.subject nanofrabication en
dc.subject atomic force microscopy en
dc.subject polycarbonate en
dc.description.abstract In this paper, we investigated the effect of scratching direction in AFM scratching. The understanding of this effect is one of the key factors in the patterning process. In our experiment, several testing grooves were engraved in all four basic directions (forward, backward, right and left) on polycarbonate substrate using Si probe. Both the fabrication and subsequent characterization were performed using the identical atomic force microscope. Our results were compared to previous reports. It was found that scratching in the backward direction is the most suitable for the common usage. © 2017 IEEE. en
utb.faculty Faculty of Applied Informatics
dc.identifier.uri http://hdl.handle.net/10563/1007447
utb.identifier.obdid 43877484
utb.identifier.scopus 2-s2.0-85020233639
utb.identifier.wok 000403402600054
utb.source d-scopus
dc.date.accessioned 2017-09-08T12:14:56Z
dc.date.available 2017-09-08T12:14:56Z
dc.description.sponsorship Ministry of Education, Youth and Sports of the Czech Republic within the National Sustainability Programme [LO1303 (NISMT-7771/2014)]
utb.contributor.internalauthor Kudělka, Josef
utb.contributor.internalauthor Martínek, Tomáš
utb.contributor.internalauthor Navrátil, Milan
utb.contributor.internalauthor Křesálek, Vojtěch
utb.scopus.affiliation Department of Electronics and Measurement, Faculty of Applied Informatics, Tomas Bata University in Zlin, Zlin, Czech Republic
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