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The effect of scratching direction in AFM nanolithography

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Citace článku v konferenčním sborníku:
KUDĚLKA, Josef, Tomáš MARTÍNEK, Milan NAVRÁTIL a Vojtěch KŘESÁLEK. The effect of scratching direction in AFM nanolithography. In: 7th International Conference on Information Science and Technology, ICIST 2017 - Proceedings [online]. Da Nang: Institute of Electrical and Electronics Engineers (IEEE), 2017, s. 331-334. [cit. 2024-05-22]. ISSN 2164-4357. Dostupné z: http://ieeexplore.ieee.org/abstract/document/7926779/.

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