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Nanopatterning of silicon nitride membranes

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dc.title Nanopatterning of silicon nitride membranes en
dc.contributor.author Matějka, Milan
dc.contributor.author Krátký, Stanislav
dc.contributor.author Řiháček, Tomáš
dc.contributor.author Kolařík, Vladimír
dc.contributor.author Chlumská, Jana
dc.contributor.author Urbánek, Michal
dc.relation.ispartof 8th International Conference on Nanomaterials - Research & Application (NANOCON 2016)
dc.identifier.isbn 9788087294710
dc.date.issued 2016
dc.citation.spage 709
dc.citation.epage 714
dc.event.title 8th International Conference on Nanomaterials - Research and Application, NANOCON 2016
dc.event.location Brno
utb.event.state-en Czech Republic
utb.event.state-cs Česká republika
dc.event.sdate 2016-10-19
dc.event.edate 2016-10-21
dc.type conferenceObject
dc.language.iso en
dc.publisher TANGER Ltd.
dc.relation.uri https://www.nanocon.eu/cz/sbornik-nanocon-2016/
dc.subject e-beam writer en
dc.subject silicon nitride membranes en
dc.subject nano patterning en
dc.subject anisotropic etching en
dc.description.abstract Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the membrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also discussed. en
utb.faculty University Institute
dc.identifier.uri http://hdl.handle.net/10563/1007314
utb.identifier.obdid 43876705
utb.identifier.scopus 2-s2.0-85017261626
utb.identifier.wok 000410656100123
utb.source d-scopus
dc.date.accessioned 2017-09-08T12:14:39Z
dc.date.available 2017-09-08T12:14:39Z
dc.description.sponsorship TACR project [TE 01020233]; MEYS CR [LO1212]; CAS [RVO:68081731]
dc.rights Attribution 4.0 International
dc.rights.uri http://creativecommons.org/licenses/by/4.0/
dc.rights.access openAccess
utb.ou Centre of Polymer Systems
utb.contributor.internalauthor Urbánek, Michal
utb.fulltext.affiliation MATĚJKA Milan 1*, KRÁTKÝ Stanislav 1, ŘIHÁČEK Tomáš 1, KOLAŘÍK Vladimír 1, CHLUMSKÁ Jana 1, URBÁNEK Michal 1,2 1 Institute of Scientific Instruments of the CAS, Brno, Czech Republic, EU 2 Tomas Bata University in Zlin, Centre of Polymer Systems, Zlin, Czech Republic, EU * milan.matejka@isibrno.cz
utb.fulltext.dates -
utb.wos.affiliation [Matejka, Milan; Kratky, Stanislav; Rihacek, Tomas; Kolarik, Vladimir; Chlumska, Jana; Urbanek, Michal] CAS, Inst Sci Instruments, Brno, Czech Republic; [Urbanek, Michal] Tomas Bata Univ Zlin, Ctr Polymer Syst, Zlin, Czech Republic
utb.fulltext.ou Centre of Polymer Systems
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