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Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách

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Title: Attachment/detachment of Saccharomyces cerevisiae on plasma deposited organosilicon thin films
Author: Lehocký, Marián; Amaral, Priscilla; Coelho, Maria; Sťahel, Pavel; Barros-Timmons, Ana; Coutinho, João Araújo Pereira
Document type: Peer-reviewed article; Conference paper (English)
Source document: Czechoslovak Journal of Physics. 2006, vol. 56, p. B1256-B1262
ISSN: 0011-4626 (Sherpa/RoMEO, JCR)
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DOI: https://doi.org/10.1007/s10582-006-0359-0
Abstract: Bio-interactive and bio-inert materials prepared by plasma deposition of organosilicon thin films on polycarbonate substrates were studied and described in this communication. The atmospheric pressure surface barrier discharge was applied. Nitrogen with small admixture of hexamethyldisiloxane (HMDSO) was used as plasma discharge gas. The zeta potential measurement followed by cell adhesion to polystyrene was used to find optimal values of stability of the cell suspension and cell adhesion to the tested surfaces. The samples of plasma deposited layers were characterized by contact angle measurement.
Full text: http://www.springerlink.com/content/t6164517k7q6470t/
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Citace článku v časopise:
LEHOCKÝ, Marián, Priscilla AMARAL, Maria COELHO, Pavel SŤAHEL, Ana BARROS-TIMMONS a João Araújo Pereira COUTINHO. Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách. Czechoslovak Journal of Physics [online]. 2006, vol. 56, s. B1256-B1262. [cit. 2024-04-25]. ISSN 0011-4626. Dostupné z: http://www.springerlink.com/content/t6164517k7q6470t/.

Citace článku v konferenčním sborníku:
LEHOCKÝ, Marián, Priscilla AMARAL, Maria COELHO, Pavel SŤAHEL, Ana BARROS-TIMMONS a João Araújo Pereira COUTINHO. Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách. In: Czechoslovak Journal of Physics [online]. Prague: Fyzikální ústav Akademie věd České republiky, 2006, s. B1256-B1262. [cit. 2024-04-25]. ISSN 0011-4626. Dostupné z: http://www.springerlink.com/content/t6164517k7q6470t/.

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