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The effect of temperature gradient on the variation of surface topography and reflectivity of anisotropically etched silicon wafers

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Citace článku v časopise:
KOTĚNA, Jan, Antonín MINAŘÍK, Erik WRZECIONKO, Petr SMOLKA, Magda MINAŘÍKOVÁ, Martin MINAŘÍK, Aleš MRÁČEK, Ivo KUŘITKA a Michal MACHOVSKÝ. The effect of temperature gradient on the variation of surface topography and reflectivity of anisotropically etched silicon wafers. Sensors and Actuators, A: Physical [online]. 2017, vol. 262, s. 1-9. [cit. 2019-08-24]. ISSN 0924-4247. Dostupné z: https://www.sciencedirect.com/science/article/pii/S092442471630646X.

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