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Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces

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dc.title Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces en
dc.contributor.author Lehocký, Marián
dc.contributor.author Sťahel, Pavel
dc.contributor.author Koutný, Marek
dc.contributor.author Čech, Jan
dc.contributor.author Institoris, Jakub
dc.contributor.author Mráček, Aleš
dc.relation.ispartof Journal of Materials Processing Technology
dc.identifier.issn 0924-0136 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued 2009
utb.relation.volume 209
utb.relation.issue 6
dc.citation.spage 2871
dc.citation.epage 2875
dc.type article
dc.language.iso en
dc.publisher Elsevier Science SA en
dc.identifier.doi 10.1016/j.jmatprotec.2008.06.042
dc.relation.uri https://www.sciencedirect.com/science/article/pii/S0924013608005487
dc.subject Rhodococcus en
dc.subject Plasma Deposition en
dc.subject Cell adhesion en
dc.subject Barrier discharge en
dc.subject Thin films en
dc.description.abstract The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flowrate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma. en
utb.faculty University Institute
dc.identifier.uri http://hdl.handle.net/10563/1001699
utb.identifier.rivid RIV/70883521:28610/09:63508003!RIV10-MSM-28610___
utb.identifier.obdid 43861796
utb.identifier.scopus 2-s2.0-61549133600
utb.identifier.wok 000264674500016
utb.source j-riv
utb.ou Centre of Polymer Systems
utb.contributor.internalauthor Lehocký, Marián
utb.contributor.internalauthor Koutný, Marek
utb.contributor.internalauthor Mráček, Aleš
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