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Photolitography on flexible substrates

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dc.title Photolitography on flexible substrates en
dc.contributor.author Urbánek, Michal
dc.contributor.author Urbánek, Pavel
dc.contributor.author Kuřitka, Ivo
dc.contributor.author Kolařík, Vladimír
dc.relation.ispartof NANOCON 2017 - Conference Proceedings, 9th International Conference on Nanomaterials - Research and Application
dc.identifier.isbn 9788087294819
dc.date.issued 2018
utb.relation.volume 2017-October
dc.citation.spage 914
dc.citation.epage 917
dc.event.title 9th International Conference on Nanomaterials - Research and Application, NANOCON 2017
dc.event.location Brno
utb.event.state-en Czech Republic
utb.event.state-cs Česká republika
dc.event.sdate 2017-10-18
dc.event.edate 2017-10-20
dc.type conferenceObject
dc.language.iso en
dc.publisher TANGER Ltd.
dc.subject photolithography en
dc.subject flexible substrates en
dc.subject metal layer en
dc.description.abstract Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates. © 2018 TANGER Ltd. All Rights Reserved. en
utb.faculty University Institute
dc.identifier.uri http://hdl.handle.net/10563/1008183
utb.identifier.obdid 43876656
utb.identifier.scopus 2-s2.0-85051850406
utb.identifier.wok 000452823300152
utb.source d-scopus
dc.date.accessioned 2018-08-30T13:31:28Z
dc.date.available 2018-08-30T13:31:28Z
dc.description.sponsorship Ministry of Education, Youth and Sports of the Czech Republic - program NPU I [LO1504]; Operational Program Research and Development for Innovations - European Regional Development Fund (ERDF); national budget of the Czech Republic [CZ.1.05/2.1.00/19.0409]
dc.rights Attribution 4.0 International
dc.rights.uri http://creativecommons.org/licenses/by/4.0/
dc.rights.access openAccess
utb.ou Centre of Polymer Systems
utb.contributor.internalauthor Urbánek, Michal
utb.contributor.internalauthor Urbánek, Pavel
utb.contributor.internalauthor Kuřitka, Ivo
utb.wos.affiliation [Urbanek, Michal; Urbanek, Pavel; Kuritka, Ivo] Tomas Bata Univ Zlin, Ctr Polymer Syst, Univ Inst, Zlin, Czech Republic; [Kolarik, Vladimir] ASCR, Inst Sci Instruments, Vvi, Brno, Czech Republic
utb.scopus.affiliation Centre of Polymer Systems, University Institute, Tomas Bata University in Zlín, Czech Republic; Institute of Scientific Instruments of the ASCR, v.v.i., Brno, Czech Republic
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Attribution 4.0 International Except where otherwise noted, this item's license is described as Attribution 4.0 International