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The influence of thickness and used solvent on luminescence and photodegradation of polysilane thin films

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dc.title The influence of thickness and used solvent on luminescence and photodegradation of polysilane thin films en
dc.contributor.author Urbánek, Pavel
dc.contributor.author Kuřitka, Ivo
dc.contributor.author Urbánek, Michal
dc.relation.ispartof NANOCON 2011
dc.identifier.isbn 978-80-87294-27-7
dc.date.issued 2011
dc.citation.spage 94
dc.citation.epage 100
dc.event.title 3rd International Conference on NANOCON
dc.event.location Brno
utb.event.state-en Czech Republic
utb.event.state-cs Česká republika
dc.event.sdate 2011-09-21
dc.event.edate 2011-09-23
dc.type conferenceObject
dc.language.iso en
dc.publisher TANGER Ltd. en
dc.subject polysilane en
dc.subject photodegradation en
dc.subject photoluminescence en
dc.subject thin film en
dc.subject metastability en
dc.description.abstract Analysis of the influence of processing parameters on the photoluminescence (PL) of a homopolymer poly(methylphenylsilane) (PMPSi) and a copolymer - poly[dimethylsilane-methylphenylsilane] (P[DMSi-MPSi]) is presented. The influence of solvent type and effect of thickness of prepared thin films were investigated by the fluorescence spectrometry. There are fundamental differences between thin film and thick film. In thick films, the sigma-conjugation length of polymer chain segments is reasonably longer approved by strong bathochromic shift in the excitation spectra. Moreover, degradation of both polysilane materials was observed as photoluminescence decay measured at two different degradation wavelengths 285 and 330 nm in vacuum. Two patterns of degradation behaviour dependent on film thickness were observed with transition at about 500 nm as in fluorescence spectra too. The degradation and metastability phenomena described in previous papers were observed on thick drop cast films only, which means that they are not general effects, but dependent on film thickness. Hence, the new facts are discussed and the interpretation is extended in terms of mesoscale confinement effects on thin films. en
utb.faculty Faculty of Technology
utb.faculty University Institute
dc.identifier.uri http://hdl.handle.net/10563/1002935
utb.identifier.rivid RIV/70883521:28110/11:43867105!RIV12-MSM-28110___
utb.identifier.rivid RIV/70883521:28610/11:43867105!RIV12-MSM-28610___
utb.identifier.obdid 43867350
utb.identifier.scopus 2-s2.0-84923690127
utb.identifier.wok 000306686700014
utb.source d-wok
dc.date.accessioned 2012-09-17T16:22:16Z
dc.date.available 2012-09-17T16:22:16Z
utb.ou Centre of Polymer Systems
utb.identifier.utb-sysno 63260
utb.contributor.internalauthor Urbánek, Pavel
utb.contributor.internalauthor Kuřitka, Ivo
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