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Plazmatická polymerizace fenylmethylsilanu

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dc.title Plazmatická polymerizace fenylmethylsilanu cs
dc.title Plasma polymerisation of methylphenylsilane en
dc.contributor.author Salyk, Ota
dc.contributor.author Broža, Pavel
dc.contributor.author Dokoupil, Norbert
dc.contributor.author Herrmann, Radim
dc.contributor.author Kuřitka, Ivo
dc.contributor.author Pryček, Jiří
dc.contributor.author Weiter, Martin
dc.relation.ispartof Surface and Coatings Technology
dc.identifier.issn 0257-8972 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued 2005-10-1
utb.relation.volume 200
utb.relation.issue 1-4
dc.citation.spage 486
dc.citation.epage 489
dc.event.title 9th International Conference on Plasma Surface Engineering
dc.event.location Garmisch Partenkirchen
utb.event.state-en Germany
utb.event.state-cs Německo
dc.event.sdate 2004-09-13
dc.event.edate 2004-09-17
dc.type article
dc.type conferenceObject
dc.language.iso en
dc.publisher Elsevier Science SA en
dc.identifier.doi 10.1016/j.surfcoat.2005.02.054
dc.relation.uri https://www.sciencedirect.com/science/article/pii/S0257897205002689
dc.subject polysilan cs
dc.subject PMPS cs
dc.subject plasmatická depozice cs
dc.subject hmotnostní spektroskopie cs
dc.subject polysilane en
dc.subject PMPS en
dc.subject plasma deposition en
dc.subject mass spectroscopy en
dc.description.abstract CVD depozice poly(methylphenylsilanu) v dohasínajícím plazmatu MW ECR a v RF plazmatu jsou zkoumány z hlediska složení plazmatu a vlastností výsledných vrstev. K analýze bylo použito jednak přímo hmotnostního spektrometru a dale byly s pomocí plynové chromatografie zkoumány produkty plazmochemických reakcí ve vymražených vzorcích. cs
dc.description.abstract Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma (5-7%) and the deposition rate is larger (1.5 nm s(-1)) in comparison with RF plasma (0.2 nm s(-1)). The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared. (c) 2005 Elsevier B.V All rights reserved. en
utb.faculty Faculty of Technology
dc.identifier.uri http://hdl.handle.net/10563/1001970
utb.identifier.rivid RIV/70883521:28110/05:63503788
utb.identifier.obdid 14053019
utb.identifier.scopus 2-s2.0-24644499988
utb.identifier.wok 000232327800107
utb.source d-wok
dc.date.accessioned 2011-08-09T07:34:19Z
dc.date.available 2011-08-09T07:34:19Z
utb.contributor.internalauthor Kuřitka, Ivo
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