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High-temperature ultrasensitive FET-based CVD graphene Hall probes

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dc.title High-temperature ultrasensitive FET-based CVD graphene Hall probes en
dc.contributor.author Supalová, Linda
dc.contributor.author Bartošík, Miroslav
dc.contributor.author Švarc, Vojtěch
dc.contributor.author Mach, Jindřich
dc.contributor.author Piastek, Jakub
dc.contributor.author Špaček, Ondřej
dc.contributor.author Konečný, Martin
dc.contributor.author Šikola, Tomáš
dc.relation.ispartof ACS Applied Electronic Materials
dc.identifier.issn 2637-6113 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued 2025
utb.relation.volume 7
utb.relation.issue 13
dc.citation.spage 5889
dc.citation.epage 5897
dc.type article
dc.language.iso en
dc.publisher American Chemical Society
dc.identifier.doi 10.1021/acsaelm.5c00351
dc.relation.uri https://pubs.acs.org/doi/10.1021/acsaelm.5c00351
dc.relation.uri https://pubs.acs.org/doi/pdf/10.1021/acsaelm.5c00351?ref=article_openPDF
dc.subject graphene en
dc.subject Hall probe en
dc.subject field-effect transistor en
dc.subject sensitivity en
dc.subject high temperature en
dc.subject Carrier Concentration en
dc.subject Defects en
dc.subject Field Emission en
dc.subject Hall Effect en
dc.subject Hall Effect Transducers en
dc.subject High Temperature Applications en
dc.subject Passivation en
dc.subject Probes en
dc.subject Current Sensors en
dc.subject Cvd Graphene en
dc.subject Field-effect Transistor en
dc.subject Graphenes en
dc.subject Hall Probe en
dc.subject Highest Temperature en
dc.subject Motion Detectors en
dc.subject Performance en
dc.subject Sensitivity en
dc.subject Ultrasensitive en
dc.subject Field Effect Transistors en
dc.subject Graphene en
dc.description.abstract Hall probes play a critical role in industrial applications such as electrical compasses, current sensors, and motion detectors; however, their performance often deteriorates at high temperatures. This study presents a magnetic-field probe with an ultrahigh sensitivity of 880 Ω/T at 150 °C, achieved using a graphene Hall bar integrated into a field-effect transistor (FET) architecture. To attain this exceptional sensitivity at elevated temperatures, careful control of doping, passivation, and manufacturing defects is essential. The doping level is optimized by adjusting the gate voltage to maintain the carrier concentration near the charge neutrality point (CNP). Further improvements in sensor response at high temperatures, as well as nearly a 2-fold increase in sensitivity at room temperature, are realized through polymer passivation of graphene. In contrast, it is demonstrated that patterning graphene into a narrower channel can increase the number of defects, which reduces the Hall probe’s sensitivity. These findings demonstrate the potential of CVD graphene as a durable and high-performance material for Hall probes in challenging environments. en
utb.faculty Faculty of Technology
dc.identifier.uri http://hdl.handle.net/10563/1012555
utb.identifier.scopus 2-s2.0-105008580301
utb.identifier.wok 001518463400001
utb.source j-scopus
dc.date.accessioned 2025-11-27T12:48:51Z
dc.date.available 2025-11-27T12:48:51Z
dc.description.sponsorship We acknowledge the support by the Grant Agency of the Czech Republic (Grant No. 25-16894S), OP JAK (Project No. CZ.02.01.01/00/22_008/0004594 TERAFIT), MEYS CR (Project No. LQ1601\u2013CEITEC 2020), and CzechNanoLab Research Infrastructure supported by MEYS CR (LM2023051).
dc.description.sponsorship Ministerstvo ?kolstv?, Ml?de?e a Telov?chovy [25-16894S, CZ.02.01.01/00/22_008/0004594 TERAFIT]; Grant Agency of the Czech Republic [LM2023051]; MEYS CR; CzechNanoLab Research Infrastructure
dc.rights Attribution 4.0 International
dc.rights.uri http://creativecommons.org/licenses/by/4.0/
dc.rights.access openAccess
utb.ou Department of Physics and Materials Engineering
utb.contributor.internalauthor Bartošík, Miroslav
utb.fulltext.sponsorship We acknowledge the support by the Grant Agency of the Czech Republic (Grant No. 25-16894S), OP JAK (Project No. CZ.02.01.01/00/22_008/0004594 TERAFIT), MEYS CR (Project No. LQ1601–CEITEC 2020), and CzechNanoLab Research Infrastructure supported by MEYS CR (LM2023051).
utb.wos.affiliation [Supalova, Linda; Bartosik, Miroslav; Svarc, Vojtech; Mach, Jindrich; Piastek, Jakub; Spacek, Ondrej; Konecny, Martin; Sikola, Tomas] Brno Univ Technol CEITEC BUT, Cent European Inst Technol, Brno 61200, Czech Republic; [Supalova, Linda; Bartosik, Miroslav; Mach, Jindrich; Piastek, Jakub; Spacek, Ondrej; Konecny, Martin; Sikola, Tomas] Brno Univ Technol, Inst Phys Engn, Brno 61669, Czech Republic; [Bartosik, Miroslav] Tomas Bata Univ Zlin, Fac Technol, Dept Phys & Mat Engn, Zlin 76001, Czech Republic
utb.scopus.affiliation Brno University of Technology, Brno, Czech Republic; Brno University of Technology, Brno, Czech Republic; Tomas Bata University in Zlin, Zlin, Czech Republic
utb.fulltext.projects 25-16894S
utb.fulltext.projects CZ.02.01.01/00/22_008/0004594 TERAFIT
utb.fulltext.projects LQ1601–CEITEC 2020
utb.fulltext.projects LM2023051
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