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Hiding E-beam exposure fields by deterministic aperiodic 2D patterning
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| Title: | Hiding E-beam exposure fields by deterministic aperiodic 2D patterning |
| Author: | Horáček, Miroslav; Knápek, Alexandr; Matějka, Milan; Krátký, Stanislav; Urbánek, Michal; Mika, Filip; Kolařík, Vladimír |
| Document type: | Conference paper (English) |
| Source document: | Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. 2018, p. 36-36 |
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ČSN ISO 690:2011 citation
Citace článku v konferenčním sborníku:
HORÁČEK, Miroslav, Alexandr KNÁPEK, Milan MATĚJKA, Stanislav KRÁTKÝ, Michal URBÁNEK, Filip MIKA a Vladimír KOLAŘÍK. Hiding E-beam exposure fields by deterministic aperiodic 2D patterning. In: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation [online]. Brno: Czech Academy of Science, Institute of Scientific Instruments, 2018, s. 36-36.
These citations are software generated and may contain errors. To verify accuracy, check the appropriate style guide.
HORÁČEK, Miroslav, Alexandr KNÁPEK, Milan MATĚJKA, Stanislav KRÁTKÝ, Michal URBÁNEK, Filip MIKA a Vladimír KOLAŘÍK. Hiding E-beam exposure fields by deterministic aperiodic 2D patterning. In: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation [online]. Brno: Czech Academy of Science, Institute of Scientific Instruments, 2018, s. 36-36.
These citations are software generated and may contain errors. To verify accuracy, check the appropriate style guide.
