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Recent developments in surface science and engineering, thin films, nanoscience, biomaterials, plasma science, and vacuum technology

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dc.title Recent developments in surface science and engineering, thin films, nanoscience, biomaterials, plasma science, and vacuum technology en
dc.contributor.author Mozetič, Miran
dc.contributor.author Vesel, Alenka
dc.contributor.author Primc, Gregor
dc.contributor.author Eisenmenger-Sittner, Christopher
dc.contributor.author Bauer, Jürgen
dc.contributor.author Eder, Andreas
dc.contributor.author Schmid, Gerwin H.S.
dc.contributor.author Ruzic, David Neil
dc.contributor.author Ahmed, Zeeshan
dc.contributor.author Barker, Daniel S.
dc.contributor.author Douglass, Kevin O.
dc.contributor.author Eckel, Stephen
dc.contributor.author Fedchak, James A.
dc.contributor.author Hendricks, Jay H.
dc.contributor.author Klimov, Nikolai N.
dc.contributor.author Ricker, Jacob E.
dc.contributor.author Scherschligt, Julia
dc.contributor.author Stone, Jack A.
dc.contributor.author Strouse, Gregory F.
dc.contributor.author Capan, Ivana
dc.contributor.author Buljan, Maja
dc.contributor.author Miloševič, Slobodan
dc.contributor.author Teichert, Christian
dc.contributor.author Cohen, Sidney R.
dc.contributor.author Silva, Ana Gomes
dc.contributor.author Lehocký, Marián
dc.contributor.author Humpolíček, Petr
dc.contributor.author Rodríguez, Clara I.
dc.contributor.author Hernández-Montelongo, Jacobo
dc.contributor.author Mercier, Denis
dc.contributor.author Manso-Silván, Miguel
dc.contributor.author Ceccone, Giacomo
dc.contributor.author Galtayries, Anouk
dc.contributor.author Stana-Kleinschek, Karin
dc.contributor.author Petrov., Ivan G.
dc.contributor.author Greene, Joseph E.
dc.contributor.author Avila, Jose A.
dc.contributor.author Chen, C.Y.
dc.contributor.author Caja-Munoz, Borja
dc.contributor.author Yi, H.
dc.contributor.author Boury, Antoine
dc.contributor.author Lorcy, Stéphane
dc.contributor.author Asensio, María Carmen
dc.contributor.author Bredin, Jérôme
dc.contributor.author Gans, Timo
dc.contributor.author Deborah O'Connell, Deborah
dc.contributor.author Brendin, J.
dc.contributor.author Reniers, François
dc.contributor.author Vincze, A.
dc.contributor.author Anderle, Mariano
dc.contributor.author Montelius, Lars
dc.relation.ispartof Thin Solid Films
dc.identifier.issn 0040-6090 OCLC, Ulrich, Sherpa/RoMEO, JCR
dc.date.issued 2018
utb.relation.volume 660
dc.citation.spage 120
dc.citation.epage 160
dc.type review
dc.language.iso en
dc.publisher Elsevier BV
dc.identifier.doi 10.1016/j.tsf.2018.05.046
dc.relation.uri https://www.sciencedirect.com/science/article/pii/S0040609018303730
dc.description.abstract Nanometer-sized structures, surfaces and sub-surface phenomena have played an enormous role in science and technological applications and represent a driving-force of current interdisciplinary science. Recent developments include the atomic-scale characterization of nanoparticles, molecular reactions at surfaces, magnetism at the atomic scale, photoelectric characterization of nanostructures as well as two-dimensional solids. Research and development of smart nanostructured materials governed by their surface properties is a rapidly growing field. The main challenge is to develop an accurate and robust electronic structure description. The density of surface-related trap states is analyzed by transient UV photoconductivity and temperature-dependent admittance spectroscopy. An advanced application of thin films on shaped substrates is the deposition of catalytic layers on hollow glass microspheres for hydrogen storage controlled exothermal hydrolytic release. Surface properties of thin films including dissolution and corrosion, fouling resistance, and hydrophilicity/hydrophobicity are explored to improve materials response in biological environments and medicine. Trends in surface biofunctionalization routes based on vacuum techniques, together with advances in surface analysis of biomaterials, are discussed. Pioneering advances in the application of X-ray nanodiffraction of thin film cross-sections for characterizing nanostructure and local strain including in-situ experiments during nanoindentation are described. Precise measurements and control of plasma properties are important for fundamental investigations and the development of next generation plasma-based technologies. Critical control parameters are the flux and energy distribution of incident ions at reactive surfaces; it is also crucial to control the dynamics of electrons initiating non-equilibrium chemical reactions. The most promising approach involves the exploitation of complementary advantages in direct measurements combined with specifically designed numerical simulations. Exciting new developments in vacuum science and technology have focused on forward-looking and next generation standards and sensors that take advantage of photonics based measurements. These measurements are inherently fast, frequency based, easily transferrable to sensors based on photonics and hold promise of being disruptive and transformative. Realization of Pascal, the SI unit for pressure, a cold-atom trap based ultra-high and extreme high vacuum (UHV and XHV) standard, dynamic pressure measurements and a photonic based thermometer are three key examples that are presented. © 2018 en
utb.faculty University Institute
dc.identifier.uri http://hdl.handle.net/10563/1008052
utb.identifier.obdid 43879647
utb.identifier.scopus 2-s2.0-85048550834
utb.identifier.wok 000441177500015
utb.identifier.coden THSFA
utb.source j-scopus
dc.date.accessioned 2018-07-27T08:47:41Z
dc.date.available 2018-07-27T08:47:41Z
dc.description.sponsorship P2-0082, Core; ARRS, Javna Agencija za Raziskovalno Dejavnost RS; Universität zu Köln; TU Delft, Technische Universiteit Delft; ESRF, European Synchrotron Radiation Facility; AV ČR, Akademie Věd České Republiky; IBM, International Business Machines Corporation; CAS, Chinese Academy of Sciences; BM25; GA 607232; 17-05095S, GACR, Grantová Agentura České Republiky; Beijing Key Lab of Fine Ceramics Opening Fund
dc.description.sponsorship MSC project Thinface [GA 607232]; Slovenian Research Agency [P2-0082]; Czech Science Foundation [17-05095S]
utb.ou Centre of Polymer Systems
utb.contributor.internalauthor Lehocký, Marián
utb.contributor.internalauthor Humpolíček, Petr
utb.wos.affiliation [Mozetic, M.; Vesel, A.; Primc, G.; Eisenmenger-Sittner, C.; Bauer, J.; Eder, A.; Schmid, G. H. S.; Ruzic, D. N.; Ahmed, Z.; Barker, D.; Douglass, K. O.; Eckel, S.; Fedchak, J. A.; Hendricks, J.; Klimov, N.; Ricker, J.; Scherschligt, J.; Stone, J.; Strouse, G.; Capan, I.; Buljan, M.; Milosevic, S.; Teichert, C.; Cohen, S. R.; Silva, A. G.; Lehocky, M.; Humpolicek, P.; Rodriguez, C.; Hernandez-Montelongo, J.; Mercier, D.; Manso-Silvan, M.; Ceccone, G.; Galtayries, A.; Stana-Kleinschek, K.; Petrov, I.; Greene, J. E.; Avila, J.; Chen, C. Y.; Caja-Munoz, B.; Yi, H.; Boury, A.; Lorcy, S.; Asensio, M. C.; Gans, T.; O'Connell, D.; Brendin, J.; Reniers, F.; Vincze, A.; Anderle, M.; Montelius, L.] Int Union Vacuum Sci Tech & Applicat, Ave Renaissance 30, B-1000 Brussels, Belgium; [Mozetic, M.; Vesel, A.; Primc, G.] Jozef Stefan Inst, Jamova Cesta 39, Ljubljana 1000, Slovenia; [Eisenmenger-Sittner, C.; Bauer, J.; Eder, A.; Schmid, G. H. S.] Vienna Univ Technol, Wiedner Hauptstr 8-10, A-1040 Vienna, Austria; [Ruzic, D. N.] Univ Illinois, Dept Nucl Plasma & Radiol Engn, 104 S Wright St, Urbana, IL 61801 USA; [Ahmed, Z.; Barker, D.; Douglass, K. O.; Eckel, S.; Fedchak, J. A.; Hendricks, J.; Klimov, N.; Ricker, J.; Scherschligt, J.; Stone, J.; Strouse, G.] NIST, 100 Bur Dr, Gaithersburg, MD 20899 USA; [Capan, I.; Buljan, M.] Rudjer Boskovic Inst, Bijenicka Cesta 54, Zagreb 10000, Croatia; [Milosevic, S.] Inst Phys, Bijenicka Cesta 46, Zagreb 10000, Croatia; [Teichert, C.] Univ Leoben, Inst Phys, Franz Josef Str 18, A-8700 Leoben, Austria; [Cohen, S. R.] Weizmann Inst Sci, Herzl 234, IL-7610001 Rehovot, Israel; [Silva, A. G.] Univ Nova Lisboa, Campus Caparica, P-2829516 Caparica, Portugal; [Lehocky, M.; Humpolicek, P.] Tomas Bata Univ Zlin, Ctr Polymer Syst, Nam TG Masaryka 5555, Zlin 76001, Czech Republic; [Rodriguez, C.; Hernandez-Montelongo, J.; Manso-Silvan, M.] Univ Autonoma Madrid, Dept Fis Aplicada, E-28049 Madrid, Spain; [Rodriguez, C.; Hernandez-Montelongo, J.; Manso-Silvan, M.] Univ Autonoma Madrid, Inst Ciencia Mat Nicolas Cabrera, E-28049 Madrid, Spain; [Hernandez-Montelongo, J.] Univ Estadual Campinas, Dept Fis Aplicada, BR-13083859 Campinas, SP, Brazil; [Mercier, D.; Galtayries, A.] PSL Res Univ, Inst Rech Chim Paris, CNRS, Chim ParisTech, F-75005 Paris, France; [Ceccone, G.] European Commiss, Joint Res Ctr, Via Enrico Fermi, I-21020 Ispra, Va, Italy; [Stana-Kleinschek, K.] Univ Maribor, Smetanova 17, SLO-2000 Maribor, Slovenia; [Petrov, I.; Greene, J. E.] Univ Illinois, Dept Mat Sci, 104 S Goodwin Ave, Urbana, IL 61801 USA; [Avila, J.; Chen, C. Y.; Caja-Munoz, B.; Yi, H.; Boury, A.; Lorcy, S.; Asensio, M. C.] Synchrotron SOLEIL, BP 48, F-91190 St Aubin, France; [Avila, J.; Chen, C. Y.; Caja-Munoz, B.; Yi, H.; Boury, A.; Lorcy, S.; Asensio, M. C.] Univ Paris Saclay, BP 48, F-91190 St Aubin, France; [Bredin, J.; Gans, T.; O'Connell, D.; Brendin, J.] Univ York, York Plasma Inst, Dept Phys, York Y010 5DD, N Yorkshire, England; [Reniers, F.] Univ Libre Brixelles, CP260,Blvd Triomphe, B-1050 Brussels, Belgium; [Vincze, A.] Int Laser Ctr, Illcovicova 3, Bratislava 84104, Slovakia; [Anderle, M.] Italian Embassy Hanoi, 9 Le Phung Hieu, Hanoi, Vietnam; [Montelius, L.] Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga S-N, P-4715330 Braga, Portugal
utb.scopus.affiliation International Union for Vacuum Science, Technique and Applications, Avenue de la Renaissance 30, Brussels, Belgium; Jozef Stefan Institute, Jamova cesta 39, Ljubljana, Slovenia; Techical University Vienna, Wiedner Hauptstrasse 8–10, Vienna, Austria; Department of Nuclear, Plasma and Radiological Engineering, University of Illinois at Urbana-Champaign, 104 S Wright St., Urbana, IL, United States; NIST, 100 Bureau Drive, Gaithersburg, MD, United States; Rudjer Bošković Institute, Bijenička cesta 54, Zagreb, Croatia; Institute of Physics, Bijenička cesta 46, Zagreb, Croatia; Institute of Physics, Montanuniversität Leoben, Franz Josef Str. 18, Leoben, Austria; Weizmann Institute of Science, Herzl 234, Rehovot, Israel; Universidade Nova de Lisboa, Campus da Caparica, Caparica, Portugal; Centre of Polymer Systems, Tomas Bata University in Zlin, Nam. T G Masaryka 5555, Zlin, Czech Republic; Departamento de Física Aplicada and Instituto de Ciencia de Materiales Nicolás Cabrera, Universidad Autónoma de Madrid, Madrid, Spain; Departamento de Física Aplicada, Universidade Estadual de Campinas, Campinas, São Paulo, Brazil; Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris, Paris, France; European Commission, Joint Research Center, Via Enrico Fermi, Ispra, Va, Italy; University of Maribor, Smetanova 17, Maribor, Slovenia; University of Illinois, Department of Materials Science, 104 S. Goodwin Avenue, Urbana, IL, United States; Synchrotron SOLEIL and Université Paris-Saclay, L'Orme des Merisiers, BP 48, Saint-Aubin, France; York Plasma Institute, Department of Physics, University of York, Heslington, York, United Kingdom; Universite Libre de Brixelles, CP260, boulevard du Triomphe, Bruxelles, Belgium; International Laser Centre, Ilkovicova 3, Bratislava, Slovakia; Italian Embassy in Hanoi, 9, Le Phung Hieu, Hanoi, Viet Nam; International Iberian Nanotechnology Laboratory, Avenida Mestre José Veiga s/n, Braga, Portugal
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