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Plasma surface modification of polyethylene

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dc.title Plasma surface modification of polyethylene en
dc.contributor.author Lehocký, Marián
dc.contributor.author Drnovská, H.
dc.contributor.author Lapčíková, Barbora
dc.contributor.author Barros-Timmons, Ana
dc.contributor.author Trindade, Tito
dc.contributor.author Zembala, M.
dc.contributor.author Lapčík, Lubomír
dc.relation.ispartof Colloids and Surfaces A: Physicochemical and Engineering Aspects
dc.identifier.issn 0927-7757 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued 2003-07-30
utb.relation.volume 222
utb.relation.issue 1-3
dc.citation.spage 125
dc.citation.epage 131
dc.event.title International Symposium on Electrokinetic Phenomena
dc.event.location Krakow
utb.event.state-en Poland
utb.event.state-cs Polsko
dc.event.sdate 2002-08-18
dc.event.edate 2002-08-22
dc.type article
dc.type conferenceObject
dc.language.iso en
dc.publisher Elsevier Science B.V. en
dc.identifier.doi 10.1016/S0927-7757(03)00242-5
dc.relation.uri https://www.sciencedirect.com/science/article/pii/S0927775703002425
dc.subject RF plasma cs
dc.subject polyetylen cs
dc.subject dynamický kontaktní úhel smáčení cs
dc.subject SEM cs
dc.subject mikrotvrdost cs
dc.subject RF-plasma en
dc.subject polyethylene en
dc.subject dynamic contact angle en
dc.subject SEM en
dc.subject micro-hardness en
dc.description.abstract Oxidative (oxygen and air) RF-plasma treatment of HDPE was found as an effective tool for improving wettability, as well as for increasing its surface micro-hardness. The latter plasmas generate wide range of reactive species in the system, which undergo consecutive chemical reactions, creating thus several oxygen based functionalities at the interface (carbonyl, carboxyl, ether, peroxide etc.) as were detected by ATR FTIR and XPS analysis. An increased negative surface charge of plasma treated polyethylene (PE) confirms the presence of functional ionogenic groups containing oxygen. Simultaneously, the vigorous increase of the surface roughness was found as a result of the successful plasma etching. (C) 2003 Elsevier B.V. All rights reserved. en
utb.faculty Faculty of Technology
dc.identifier.uri http://hdl.handle.net/10563/1002004
utb.identifier.rivid RIV/70883521:28110/03:63501361
utb.identifier.obdid 11552779
utb.identifier.scopus 2-s2.0-0042623724
utb.identifier.wok 000184895400015
utb.identifier.coden CPEAE
utb.source d-wok
dc.date.accessioned 2011-08-09T07:34:28Z
dc.date.available 2011-08-09T07:34:28Z
utb.contributor.internalauthor Lehocký, Marián
utb.contributor.internalauthor Lapčík, Lubomír
utb.contributor.internalauthor Lapčíková, Barbora
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