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Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách

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dc.title Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách cs
dc.title Attachment/detachment of Saccharomyces cerevisiae on plasma deposited organosilicon thin films en
dc.contributor.author Lehocký, Marián
dc.contributor.author Amaral, Priscilla
dc.contributor.author Coelho, Maria
dc.contributor.author Sťahel, Pavel
dc.contributor.author Barros-Timmons, Ana
dc.contributor.author Coutinho, João Araújo Pereira
dc.relation.ispartof Czechoslovak Journal of Physics
dc.identifier.issn 0011-4626 OCLC, Ulrich, Sherpa/RoMEO, JCR
dc.date.issued 2006
utb.relation.volume 56
dc.citation.spage B1256
dc.citation.epage B1262
dc.event.title 22nd Symposium on Plasma Physics and Technology
dc.event.location Prague
utb.event.state-en Czech Republic
utb.event.state-cs Česká republika
dc.event.sdate 2006-06-26
dc.event.edate 2006-06-29
dc.type article
dc.type conferenceObject
dc.language.iso en
dc.publisher Fyzikální ústav Akademie věd České republiky cs
dc.identifier.doi 10.1007/s10582-006-0359-0
dc.relation.uri http://www.springerlink.com/content/t6164517k7q6470t/
dc.subject Saccharomyces cerevisiae cs
dc.subject plazmová depozice cs
dc.subject buněčná adheze cs
dc.subject biomateriály cs
dc.subject tenké vrstvy cs
dc.subject bariérový výboj cs
dc.subject Saccharomyces cerevisiae en
dc.subject plasma deposition en
dc.subject cell adhesion en
dc.subject biomaterials en
dc.subject thin films en
dc.subject barrier discharge en
dc.description.abstract Bio-interaktivní a bio-inertní materiály připravené pomocí depozice organokřemičitých vrstev v plazmatu na povrchu polykarbonátu byly studovány a popsány v tomto příspěvku. Dusík s malou příměsí hexamethyldisiloxanu byl použit jako plazmový plyn. cs
dc.description.abstract Bio-interactive and bio-inert materials prepared by plasma deposition of organosilicon thin films on polycarbonate substrates were studied and described in this communication. The atmospheric pressure surface barrier discharge was applied. Nitrogen with small admixture of hexamethyldisiloxane (HMDSO) was used as plasma discharge gas. The zeta potential measurement followed by cell adhesion to polystyrene was used to find optimal values of stability of the cell suspension and cell adhesion to the tested surfaces. The samples of plasma deposited layers were characterized by contact angle measurement. en
utb.faculty Faculty of Technology
dc.identifier.uri http://hdl.handle.net/10563/1001953
utb.identifier.rivid RIV/70883521:28110/06:63504772
utb.identifier.obdid 14555930
utb.identifier.scopus 2-s2.0-33750741454
utb.identifier.wok 000241337100001
utb.source d-wok
dc.date.accessioned 2011-08-09T07:34:17Z
dc.date.available 2011-08-09T07:34:17Z
utb.contributor.internalauthor Lehocký, Marián
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