Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách

Lehocký, Marián; Amaral, Priscilla; Coelho, Maria; Sťahel, Pavel; Barros-Timmons, Ana; Coutinho, João Araújo Pereira

dc.title	Adsorpce/desorpce Saccharomyces Cerevisiae na plazmou deponovaných organokřemičitých tenkých vrstvách	cs
dc.title	Attachment/detachment of Saccharomyces cerevisiae on plasma deposited organosilicon thin films	en
dc.contributor.author	Lehocký, Marián
dc.contributor.author	Amaral, Priscilla
dc.contributor.author	Coelho, Maria
dc.contributor.author	Sťahel, Pavel
dc.contributor.author	Barros-Timmons, Ana
dc.contributor.author	Coutinho, João Araújo Pereira
dc.relation.ispartof	Czechoslovak Journal of Physics
dc.identifier.issn	0011-4626 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued	2006
utb.relation.volume	56
dc.citation.spage	B1256
dc.citation.epage	B1262
dc.event.title	22nd Symposium on Plasma Physics and Technology
dc.event.location	Prague
utb.event.state-en	Czech Republic
utb.event.state-cs	Česká republika
dc.event.sdate	2006-06-26
dc.event.edate	2006-06-29
dc.type	article
dc.type	conferenceObject
dc.language.iso	en
dc.publisher	Fyzikální ústav Akademie věd České republiky	cs
dc.identifier.doi	10.1007/s10582-006-0359-0
dc.relation.uri	http://www.springerlink.com/content/t6164517k7q6470t/
dc.subject	Saccharomyces cerevisiae	cs
dc.subject	plazmová depozice	cs
dc.subject	buněčná adheze	cs
dc.subject	biomateriály	cs
dc.subject	tenké vrstvy	cs
dc.subject	bariérový výboj	cs
dc.subject	Saccharomyces cerevisiae	en
dc.subject	plasma deposition	en
dc.subject	cell adhesion	en
dc.subject	biomaterials	en
dc.subject	thin films	en
dc.subject	barrier discharge	en
dc.description.abstract	Bio-interaktivní a bio-inertní materiály připravené pomocí depozice organokřemičitých vrstev v plazmatu na povrchu polykarbonátu byly studovány a popsány v tomto příspěvku. Dusík s malou příměsí hexamethyldisiloxanu byl použit jako plazmový plyn.	cs
dc.description.abstract	Bio-interactive and bio-inert materials prepared by plasma deposition of organosilicon thin films on polycarbonate substrates were studied and described in this communication. The atmospheric pressure surface barrier discharge was applied. Nitrogen with small admixture of hexamethyldisiloxane (HMDSO) was used as plasma discharge gas. The zeta potential measurement followed by cell adhesion to polystyrene was used to find optimal values of stability of the cell suspension and cell adhesion to the tested surfaces. The samples of plasma deposited layers were characterized by contact angle measurement.	en
utb.faculty	Faculty of Technology
dc.identifier.uri	http://hdl.handle.net/10563/1001953
utb.identifier.rivid	RIV/70883521:28110/06:63504772
utb.identifier.obdid	14555930
utb.identifier.scopus	2-s2.0-33750741454
utb.identifier.wok	000241337100001
utb.source	d-wok
dc.date.accessioned	2011-08-09T07:34:17Z
dc.date.available	2011-08-09T07:34:17Z
utb.contributor.internalauthor	Lehocký, Marián