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Conjugated Silicon Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes

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Citace článku v časopise:
SCHAUER, František, Petr SCHAUER, Ivo KUŘITKA a Hua BAO. Conjugated Silicon Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes. Materials Transactions [online]. 2010, vol. 51, iss. 2, s. 197-201. [cit. 2019-10-17]. ISSN 1345-9678. Dostupné z: http://www.jstage.jst.go.jp/article/matertrans/51/2/51_197/_article.

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